Microscopy of Semiconducting Materials 2007
Publication year: 2008
ISBN: 978-1-4020-8615-1
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The conference focused upon the most recent advances in the study of the structural and electronic properties of semiconducting materials by the application of transmission and scanning electron microscopy, scanning probe microscopy and X-ray-based methods. Conference sessions concentrated on key topics including state-of-the-art studies in high resolution imaging and analytical electron microscopy, advanced scanning probe microscopy, scanning electron microscopy and focused ion beam applications, novel epitaxial layer phenomena, the properties of quantum nanostructures, III-nitride developments, GeSi/Si for advanced devices, metal-semiconductor contacts and silicides and the important effects of critical device processing treatments.
Subject: Chemistry and Materials Science, Canopus, Semiconductor, Transmission electron microscopy, crystals and superlattices, electron microscopy, integrated circuit, microcharacterization techniques, nanoscience and nanostructures, quantum dot, semiconductor materials, semiconductor processing treatments, thin film
