Publication year: 2006
ISBN: 978-3-540-45298-0
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This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.
Subject: Physics and Astronomy, Diffusion, Doping, Implanted shallow junctions, Ion implantation, Ion ranges, Ion-modified materials, Slicing silicon, crystal, distribution, materials properties, materials science